Multi Technique UHV Surface Analysis System for XPS, AES, SEM/SAM, ISS and depth profiling with high space and energy resolution on the different types of conducting and non conducting samples. With the possibility of modifying the material surface and performing electrochemical processes.
MOST OUTSTANDING EQUIPMENT AND COMPONENTS
Multitechnique Surface Analysis System
SERVICES OFFERED BY THE ASSET
High pressure and temperature modification of materials
Material modification in controlled environment up to 20 bar and 800 °C
Modification of outermost surface of materials
Surface modification by means of coating deposition or ion etching.
Surface analysis of electrochemically cycled materials
Surface analysis of materials after electrochemical cycling under controlled atmosphere or vacuum (~10-5 mbar).
Surface chemical composition determination
Determination of chemical composition of the material surface and subsurface with depth profiling and imaging capabilities (lateral resolution from 500 nm to 1000 nm).