Multi Technique UHV Surface Analysis System for XPS, AES, SEM/SAM, ISS and depth profiling with high space and energy resolution on the different types of conducting and non conducting samples. With the possibility of modifying the material surface and performing electrochemical processes.
Coatings and Surfaces solutions
Design and development of materials
Manufacturing processes
Multitechnique Surface Analysis System
This platform will allow for the characterization of the surface and interface of materials with high resolution in terms of composition and morphology. It is an ultra high vacuum system that integrates several surface and interface characterisation techniques such as photo emission spectroscopy (XPS, UPS), ion scattering spectroscopy and spectroscopies with lateral resolution providing imaging capability (SEM/SAM). The system has a preparation stage to modify the surface of samples under study, as well as preparations under high pressure conditions and electrochemical processes.
Material modification in controlled environment up to 20 bar and 800 °C
Surface modification by means of coating deposition or ion etching.
Surface analysis of materials after electrochemical cycling under controlled atmosphere or vacuum (~10-5 mbar).
Determination of chemical composition of the material surface and subsurface with depth profiling and imaging capabilities (lateral resolution from 500 nm to 1000 nm).